The Instructional Cleanroom CMOS Cleaning Fume Hood has hot plates for RCA1 and RCA2 cleans, a D.I. water rinse bath and a dilute HF clean bath. The baths are only available for use of CMOS-qualified processes with approved process flows. The system is currently set up for IC fabrication and restricted to designated users under the supervision of IEN’s staff. Only 2-inch wafers are allowed in the system.
The Instructional Cleanroom has two general-purpose fume hoods. They are used for chemical-related processes such as wet chemical etching, solvent cleaning, development of photoresist and photoresist removal.
The Instructional Cleanroom has two spin dryers for 2-inch wafers and 4-inch wafers, respectively. The dryers spin wafers in a Teflon carrier and dry them using hot N2 blow.