The Instructional Cleanroom has capability of fabricating MEMS devices on silicon wafers. Due to the varied nature of MEMS devices and processes, some steps of microfabrication may require extra processes outside of the Instructional Cleanroom. For example, there are limitations on material selection due to compatibility concerns with the CMOS fabrication in the cleanroom. Especially, potassium hydroxide solutions (KOH) are not allowed to be used in the Instructional Cleanroom. Instead, non-CMOS compatible steps are processed in the main Pettit cleanroom and the wafers are kept out of the Instructional Cleanroom afterward.
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