Remover -

Remover

Removers Provided

Microposit 1165a remover

	Microposit 1165a Remover
	Mixture of pure organic solvents formulated to remove all Shipley Microposit and Megaposit photoresists.

	Chemical Properties
	Recommended for use in applications where photoresist has been seen with high temperatures, strong etchants or other harsh processing conditions Metal ion free neutral pH

Other Removers

AZ 300T

	AZ 300T Remover
	Removes photoresist and residual materials left over after metal plating or etch processes

	Chemical Properties
	Prevents damage to underlying substrate layer Leaves a clean surface free of trace organic residues More aggressive on post metal etch sidewall polymers

AZ Remover 100

	AZ Remover 100
	High performance stripper for cleaner substrate surfaces and exceptional removal of novolac resins and other organic compounds

	Chemical Properties
	Neutral pH Will not damage metal substrates Water-rinsable and biodegradable Low attack on aluminum