Etchants Provided

Aluminum Etchant Type A

Source: http://seeen.spidergraphics.com/cnf5/doc/Etchant%20Datasheets.pdf

Chromium etchant type 1020

Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists. Chromium Etchants provide fine-line control with minimal undercutting. High purity formulations filtered to 0.2 micron are ideal for critical devices.

CHROMIUM ETCHANT 1020
Fast etch rate with minimal undercutting

CHROMIUM ETCHANT 1020AC
Slower etch rate to eliminate undercutting and for broader compatibility

CHROMIUM MASK ETCHANT CE-5M
Ideal for high precision photomask etching.

CHROMIUM CERMET ETCHANT TFE
For chromium-silicon films. Compatible with copper, nickel, and gold.

Source: http://transene.com/cr/

Other Etchants

Nickel Etchant TFB

Nickel Etchant TFB Etchant for evaporated or electroplated nickel films   Chemical Properties   Clear, non-flammable Compatible with positive and negative photoresists Completely miscible in water

Nickel Etchant TFG

Nickel Etchant TFG  High purity etchant for electrodeposited nickel films   Chemical Properties   Clear, non-flammable Compatible with copper, gallium arsenide and other III-V materials Compatible with positive and negative photoresists

Titanium Etchant TFT

Titanium Etchant TFT  Designed for etching evaporated films commonly employed as bonding and barrier layers   Chemical Properties   Excellent resolution and photoresist compatibility Clear, aqueous solution Non-flammable Compatible with both positive and negative photoresists

Titanium Etchant TFTN

Titanium Etchant TFTN Designed for etching Ti films on deposited glass or SiO2 substrates   Chemical Properties   Does not contain HF Clear, aqueous solution Non-flammable Compatible with both positive and negative photoresists Metallization - most metals except Al