Login
Select Login Portal
IEN - Micro/Nano Fabrication Facility
Become a User
Services
Capabilities
Safety
Processing
Rates
Contact
SUMS Home
Search
Login
Select Login Portal
Processing (Older)
1. Recipe Library
2. Fabrication Fundamentals
3. Equipment Selection
3. IEN Process Search
3. Standard Operation Procedure
About Staff
Al Etching
Annealing
Au Etching
BLE Spinner
Cambridge NanoTech ALD (left)
Cambridge NanoTech Plasma ALD - Right (non-metal)
Characterization based on Industry Standards
Chemical Dry Etch
Chemical Vapor Deposition (CVD)
Chemicals Inventory
Cr Etching
Cu Etching
Denton Infinity
Developers Provided
Development
Dicing
Direct Write
Dry Etching
Electroless Plating
Electroplating
Flipchip Bonding
General Safety
Georgia Valve and Fitting
Incident Report
Instructional Lab Tools
K&S 4522 - Au Ball Bonding
K&S 4523A - Al Wedge Bonding
Karl Suss RC8 Spinner - Marcus
Karl Suss RC8 Spinner - Pettit
Laser MicroMachining Technologies
Laurel Spinner
LPCVD
Materials
Materials
Metal Deposition
Metal Etchants
New Laser Proposal
Other Developers
Oxford ICP PECVD - Oxide
Oxford PECVD
Oxford PECVD Left - Amorphous Silicon
Oxford PECVD Left - Carbide
Oxford PECVD Right - Oxide
Oxford PECVD Right - Standard Nitride Recipe
P / N Doping
Parker
Parylene
Plasma Etching
Plasma Therm PECVD - Standard Nitride Recipe
Plasma Therm PECVD - Standard Oxide Recipe
Plasma Therm SLR RIE
Polisher / Lapper
Polisher/Lapper
Polymer
Polymer Curing/Sintering
Polysilicon
Process Flow
Process Flow
Processing Help
PVD75 Filament Evaporator
Radiation Safety
Rapid Thermal Process
Recipe Library
Remote Processing
Research Capabilities
Resists
SCS Spincoater Processing Tab
SDS Database
Semiconductor
Silicon Dioxide Etching
Silicon Nitride Etching
STS AOE ICP
STS PECVD 2
STS PECVD 2 - Oxide
Suess AltaSpray Coater
Thermo Oxidation
Thin Film Materials
Titanium Etching
Tool Selection
Tutorials
Tystar Poly Furnace 3
Unaxis PECVD
Vision RIE 1
Wet Bench Chemicals
Wet Etching
Wire Bonding
XeF2 Etching
Materials
Thin Film Materials
(Wet Etch|
Dry Etch
|
Deposition
)
Dielectrics
(Deposition|Dry etch|Wet etch)
Metals
(Deposition|Dry etch|Wet etch)
Polymers
(Deposition|Dry etch|Wet etch)
2D materials
Semiconductors
Commonly Used Wet Bench Chemicals
Acids
Bases
Developers
Solvent
Photoresist
Precursors
TMA
Processing Gases
SF
6
C
4
F
8
CHF
3
Cl
2
BCl
3
HBr
CO
2
CH
4
SiH
4
GeH
4
PH
3
B
2
H
6
Semiconductors
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu
Loading