Spray Coating
Standard Recipe for AZ4620 10um |
Mixture Ratio (Resist:Acetone:MEK) | 1:9:1 |
| Chuck Temperature | 60 C |
| Pump Rate | 4.0 uL/min |
| N2 Pressure | 1.5 bar |
| Y Speed | 180 mm/sec |
| Passes | 4 |
| Standard Recipe for NR71-3000p 7um |
Mixture Ratio (Resist:Acetone:MEK) | 1:5:1 |
| Chuck Temperature | 60 C |
| Pump Rate | 1.5 uL/min |
| N2 Pressure | 1.5 bar |
| Y Speed | 250 mm/sec |
| Passes | 4 |
| Standard Recipe for NR21-20000p 7um |
Mixture Ratio (Resist:Acetone:MEK) | 1:15:1 |
| Chuck Temperature | 60 C |
| Pump Rate | 1.5 uL/min |
| N2 Pressure | 1.5 bar |
| Y Speed | 250 mm/sec |
| Passes | 12 |
| Standard Recipe for SC1827 5um |
Mixture Ratio (Resist:Acetone:MEK) | 1:4:1 |
| Chuck Temperature | 60 C |
| Pump Rate | 2.8 uL/min |
| N2 Pressure | 1.5 bar |
| Y Speed | 250 mm/sec |
| Passes | 4 |
Spin Curves
Standard Spin Curves
BLE Spinner
Karl Suss RC8 - Marcus Spin Curves
Lithography Guide
General Dose Guide
The dosage required will often vary on a case-by-case basis. It depends on the type of resist, the thickness of the resist, and the intensity of the radiation (which itself varies on the exposure tool). Exposure tools at the IEN have intensity probes that are used to determine the intensity of the radiation. Sometimes, a log is present at the tool for users to record the measured intensity at a particular time. This can remove the need to measure the intensity everytime the tool is used.
The exposure time can be calculated by taking the dosage (found on the photoresist datasheet) and dividing it by the intensity measured. If possible, the intensity can be measure through the mask. If there is not a large enough clearfield space to accommodate the sensor, subtract 1.0 mW/cm2 to account for the intensity lost traveling through the mask. The intensity loss can vary depending on the mask material, so that value should be looked up before exposure if unable to measure through the mask.
General Resist Guide
Spinning Recipes for Provided Resists
| SC1827 | SC1813 | SPR220-7.0 | HMDS | NR71-3000P | NR9-1500PY |
| Speed (RPM) | 3000 | 3000 | 500/2500 | 3000 | 2000 | 1000 |
| Acceleration (RPM/s) | 1000 | 1000 | 1000/3000 | 1000 | 1000 | 500 |
| Time (s) | 30 | 30 | 10/40 | 30 | 40 | 40 |
| Bake Temperature (C) | 115 | 115 | 110 | Optional | 150/100(oven) | 150/100 (oven) |
| Bake Time (min) | 5 | 5 | 3 | Optional | 20/20 | 20/20 |
| Approximate Thickness (Microns) | 2.9 | 1.6 | 7.5 | N/A | 4.1 | 2.5 |
Exposure Wavelengths for Provided Resists
| SC1827 | SC1813 | SPR220-7.0 | NR71-3000P | NR9-1500PY |
| Wavelength (nm) | 405 | 405 | 365 | 365 | 365 |
Developer and Development Time for Provided Resists
| SC1827 | SC1813 | SPR220-7.0 | NR71-3000P | NR9-1500PY |
| Developer | MF-319 | MF-319 | MF-319 | RD-6 | RD-6 |
| Time | 1 min | 1 min | 2-3 min | 70 sec | 20 sec |