Polymer Curing/Sintering
Thermo Oxidation
Location: Pettit Cleanroom
Substrate Size: ?
Number of Substrates Allowed: ?
Special Features:
Polymer curing and sintering;
Wet/Dry oxidation;
Nitride growth;
Location: Marcus Inorganic Cleanroom
Substrate Size: < 4 in
Number of Substrates Allowed: 1 - 25
Depositions Available: SiO2
Flash Vaporizer: 700-1100°C;
Uniformity is usually less than 1%
Depositions available: SiO2
Substrate Size: 4"-8"
Number of Substrates Allowed: 1 - 50
Excellent Uniformity (< 1%);
Solid-source N-type doping;
Wet/Dry Oxidation;
Kooi and P-well drive-in;
LPCVD
LPCVD silicon nitride;
Oxide uniformity less than 3%;
Annealing
Sample can reach 1100C in 20 seconds;
700-1150C;
LTO/Implantation anneal;
Doping
Solid-source P-type doping;
PolySilicon
Polysilicon deposition (N-doped);
Silane and Phosphine gas;
Polysilicon deposition (P-doped);
Silane and Boron Tricholoride gas;