IEN - Micro/Nano Fabrication Facility
Processing
Gold Plating
 Equipment
           EquipmentPlating Station

Substrate Sizeup to 6" wafer



 Plating Parametersa

Plating Solution Transene Sulfite Gold TSG-250

Anode Platinized

Anode to Cathode Ratio 1:1

Temperature 43 - 71 oC

pH 6.0 - 7.0

Stirring Rate 500 rpm

Current Density 0.01 - 0.08 mA/cm2

Pulse Optional

a: The parameters are provide by Transene