The AZ P4000 positive resist series with its members AZ P4110, AZ P4330, AZ P4620 and AZ P4903 have two main characteristics:

• An improved adhesion to all common substrates for a higher stability for e. g. wet etching or plating
• A lower photo active compound concentration which allows the application of thick and very thick resist films (approx. 3 - 30 µm) 

Other characteristics:

• Steep wall profiles, high aspect ratios
• Sensitive to g-, h-, and i-line
• Recommended developers: KOH-based (e. g. AZ 400K) or TMAH-based (e. g. AZ 826 MIF)
• Standard strippers (e. g. AZ 100 Remover, TechniStrip P1316)
• Thinner and edge bead remover: AZ EBR Solvent = PGMEA

AZ P4110

• Resist film thickness range: Approx. 2 - 5 µm
• Sales units: gallons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

AZ P4330

• Resist film thickness range: Approx. 3 - 8 µm
• Sales units: gallons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

AZ P4620

• Resist fim thickness range: Approx. 6 - 20 µm
• Sales units: 250 ml, 500 ml or 1000 ml, gallons (3.78 L)

AZ P4903

• Resist film thickness range: Approx. 8 - 30 µm
• Sales units: gallons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

Development