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Processing
Equipment Baseline
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Basic Cleanroom Guides
New Processing Page - Draft
Processing Guide - old
Processing Recipes
Annealing / Sintering
Dielectric PECVD Deposition (non-thermal)
Doping
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Etching Tools Polymer Recipes
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Thermal Film Growth
Processing Fundamentals
Processing Information
Recipe Library
Doping
N-Type Dopant
P-Type Dopant
N-Type Dopant
N-Type Dopant
Tystar Furnace
Equipment
Tystar Furnace
Temp (C)
950
Pressure (mT)
atm
P-Type Dopant
P-Type Dopant
Tystar Furnace
Equipment
Tystar Furnace
Temp (C)
950
Pressure (mT)
atm
Gas 1 (sccm)
O
2
- 200
Gas 2 (sccm)
N
2
- 5000
Rate (Å/min)
N
2
- 5000
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu
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