IEN - Micro/Nano Fabrication Facility
Processing (Older)
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SCS Spincoater Processing Tab

SCS G3 Spinner Table

Spin Coater 1 Marcus small pieces up to 4"
Spin Coater 2 Pettit small pieces up to 4"
Spin Coater 3 Marcus small pieces up to 4"

General Spin Curves for SCS G3

   
   
   
   
   

  

Spinning Recipes for Provided Resists

  SC1827 SC1813 SPR220-7.0 HMDS NR71-3000P NR9-1500PY
Speed (RPM) 3000 3000 500/2500 3000 2000 1000
Acceleration (RPM/s) 1000 1000 1000/3000 1000 1000 500
Time (s) 30 30 10/40 30 40 40
Bake Temperature (C) 115 115 110 Optional 150/100(oven) 150/100 (oven)
Bake Time (min) 5 5 3 Optional 20/20 20/20
Approximate Thickness (Microns) 2.9 1.6 7.5 N/A 4.1 2.5

Exposure Wavelengths for Provided Resists

  SC1827 SC1813 SPR220-7.0 NR71-3000P NR9-1500PY
Wavelength (nm) 405 405 365 365 365

 Developer and Development Time for Provided Resists

  SC1827 SC1813 SPR220-7.0 NR71-3000P NR9-1500PY
Developer MF-319 MF-319 MF-319 RD-6 RD-6
Time 1 min 1 min 2-3 min 70 sec 20 sec
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu
Georgia Institute of Technology
Shared User Management System
791 Atlantic Drive
Atlanta GA 30332-0269 
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