Standard provided by the manufacturers (STS PECVD , PlasmaTherm deposition,RIE&ICP) for use in their processing tools. Georgia Tech access only-put your gatech e-mail as the user name microsoft will redirect to GT login.
Reports on the based oon test runs on IEN tools to check film uniformity on deposition tools or etch rate on etching tools.
Standard recipe used in the IEN cleanroom in the processing tools.
The National Nanotechnology Infrastructure Network (NINN) had a Research Experience for Teachers (RET) fellowship which sponsored teachers and community college faculty at Georgia Tech from (2006-2009) to let them activally engage in cleanroom research. These are the presentations associated with the program.
they did for their process. Please note that these are records collected through over the decade. Georgia Tech access only-put your gatech e-mail as the user name microsoft will redirect to GT login.c