Karl Suss MA6 -- Instructional Center:
IEN - Micro/Nano Fabrication Facility
Status:
Available
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Equipment Description

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on the substrate. The MA-6 can handle wafers up to 6" in size, and is optimized for 435 nm wavelength.

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility