IMS Equipment Group - SUMS - Georgia Tech Shared User Management System

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Miscellaneous Other Chemicals

Process Gases

Solid Source Materials

Special Source Materials

Standard Laboratory Chemical

Substrates

Miscellaneous Other Chemicals

(3,3,3-TRIFLUOROPROPYL)DIMETHYLCHLOROSILANE

(3-Mercaptopropyl)trimethoxysilane

(Tridecafluoro-1,1,2,2-tetrahydrooctyl) -1-dimethylchlorosilane

1% XR-1541

1,2,4-Trichlorobenzene

1,2-Dichlorobenzene

1,3,5-Trimethylbenzene

11-Mercaptoundecanoic acid

1-Chloro-4-Propoxy-9H-Thioxanthen-9-one

2-(2-Pyridinyldithio)ethaneamine hydrochloride

2,2,4 -Trimethylpentane, Anhydrous

2,4-Diethyl-9H-Thioxanthen-9-one

2-Ethyl-9,10-Dimethoxyanthracene

2-Heptanone

3-Aminopropyltriethoxysilane

3M Developmental Material EAS-1735 (Experimental)

495 PMMA Series Resists in Anisole

4-Chloro 1-Naphthol

6% XR-1541

6-azidosulfonylhexyltriethoxysilane

950 PMMA Series Resist in Anisole

Accura si 50

Acrylamide/Bis-Acrylamide, 40% Solution

Ammonium Cerium (IV) sulfate dihydrate

Ammonium Sulfide, 40-48 WT. % Solution in Water

Amyl Acetate

Anisole

AP3000 Adhesion Promoter (XU 35113.00)

APX-K1

Aquanox A4651US Cleaning Agent

Aquasave-53za

Ascorbic acid

Avatrel 1000 Developer

Avatrel 2000P Dielectric Polymer

Avatrel 2090P

Avatrel 2580-20 Polymer

Avatrel 2580-40 Polymer

Avatrel EP M Dielectric Polymer

Avatrel7584P Photodefinable Polymer

AZ EXP PLP 100XT Photoresist

AZ KWIK Strip Remover

AZ NLOF 2070 Photoresist

AZ(R) 1512 PHOTORESIST

AZ(R) EXP AX(TM) 1020P Photoresist

AZ40XT-11D Photoresist

B155 Polyboron Spin on Dopant

Baytron P VP Al

Benzyl Alcohol

Bioact EC-7R

bis(N,N'-di-sec-butylacetamidinato)dicopper (I)

Bis(trimethoxysilyl)hexane

Bismuth

Bismuth(III) nitrate pentahydrate

Bisphenol A Dimethacrylate

BISPHENOL A ETHOXYLATE

Bisphenol A Ethoxylate (2 EO//Phenol) Diacrylate

Bisphenol F Diglycidyl Ether

Borax/Sodium Borate

Boric Acid

BOROFILM 100

BORON DOPANT COATING BDC1-2000

BTS 220 Edge Bead Remover

Cabot Conductive Ink 300

CHROMIUM CERMET ETCHANT TFE

Chromium Etch 1020 AC

Chromium Trioxide

Cleaner Conditioner 231

Copper (II) Sulfate Pentahydrate (ca. 100%)

Copper Etch APS-100

Copper Etchant 49 -1

Copper Gleam 125 Additive

Copper Gleam 125 EX Carrier

Copper Sulfate pentahydrate

CR - 7S

CR-100 Chromium Etch

CR-14S Chromium Etchant

CR-7S Chromium Etchant

Crystalbond 509

Cupric Chloride, Dihydrate

Cupric Sulphate

Cuprostar LP-1

CUS3116B

Cyanoborohydride Coupling Buffer

Cyclic Olefin Copolymer

Cyclohexane

Cyclopentanone

Cyclotene 3022 - 35 Advanced Electronics Resins

CYCLOTENE 3022 - 46 Advanced Electronics Resin

D-4000 Liquid Developer Concentrate

Di(Ethylene Glycol) Dimethacrylate

Dimethoxydimethylsilane

dimethyl sulfide

Dimethyl Sulfoxide

Dimethylformamide

Diphenyldimethoxysilane

Disclean

Disodium Succinate

Dithiothreitol (1M)

Dow Corning 7920 Die Attach Adhesive

DS2100 Advanced Development System

Eagle NT-90 Photoresist

EBR PG Positive Radiation Resist Edge Bead Remover

ECCOAT UV-7993

Ecoclear Non-Solvent Cleaning Fluid

EDTA Solution

EKC 162

EKC-265

Electroless Nickel Plating Ammonia Type (ENPAT)

ELEVATE CU 6320 BRIGHTENER

ELEVATE CU 6320 CARRIER

ELEVATE CU ELECTROLYTE 20

Emulsitone

Enestra Optical Encapsulant XP 6010

Epo-tek 301-2fl, Part A

Ethylene Glycol Butyl Ether

Ethylene Glycol Monoethyl Ether

Ethylenediamine

Everon Reducer Concentrate

Everon SMT Makeup

Everon SMT Replenisher 1

Everon SMT Replenisher 2

Experimental Waveguide Core Material

Fe-12cc11 Iron Oxide Etchant

Ferric Chloride

Ferric Chloride Hexahydrate

Ferrous Chloride

Ferrous Sulfate

Flip Chip Flux FC-WS-LT-B

Fluoboric Acid

Fluorine

Formic Acid

FOX(R) - 16 Flowable Oxide

Fox(R)- 12 Flowable Oxide

Fox(R) -17 Flowable Oxide

FOX(R)-13 Flowable Oxide

Gamma Butyrolactone

Gamma-Methacryloxypropyl-trimethoxysilane

Gamma-oxo-1-pyrenebutyric acid

Glasia WG-005

Glutaraldehyde Solution

Golden Etchant GE 8110

GRAPHLINE HIGH DEFINITION DEV RTU

H1129

HD-3007

HD4000

Heptadecafluoro-1,1,2,2-tetrahydrodecyl-trichlorosilane

Hexadecane, Anhydrous 99%

Hexafluoroethane

Hexamethyldisilazane (HMDS)

Hexanes

HFE-7200 3M

H-NU 470 Visible Light Photoinitiator

Hyaluronic Acid, Sodium Salt

Hydrion Buffer Salt pH 10.00

Hydrion Buffer Salt pH 4.00

Hydrion Buffer Salt pH 7.00

Hydroquinone

Hydroxypropyl Cellulose

Hysol FP4531 Flip Chip Underfill

iCue 5001

Imidazole

Immersion Gold CF Part A

Immersion Gold CF Part B

Indium Tin Oxide Echant

Intermediate Coating IC1-200

Intervia Developer RDP 1014

Iron (III) Chloride Hexahydrate

Iron Oxide Mask Etchant

Iron yttrium oxide

Iron(III) nitrate nonahydrate

KMPR

Kodak Photo-Flo 200 Solution

Kodalith Super RT Developer, Part A

Kodalith Super RT Developer, Part B

Lanthanum nitrate hexahydrate

L-Cysteine

Lead (II) Oxide

Lead Zirconate Titanate

Lead Zirconate Titanate Polymer

lead, rod, 5.0mm diam., 99.9995%

Loctite(R) 3936 Light Cure Medical Device Adhesive

LOR B Series Resists

Low Na+ Liquid Acid Neutralizer

Magnesium AZ31B

Maleic Acid

MCC Primer 80/20 - MicroChem

Megaposit MF-24A Developer

Megaposit SPR 220 (0.7-7.0) Photoresist

Megaposit SPR 3012 Positive Photoresist

Mesitylene

Methane

Methyl Isobutyl Ketone (MIBK)

Methyl tert-Butyl Ether

Methylene Chloride

Microcrystalline Cellulose

Microfab AU 100 Liq Cond Salt

Microfab CU-300 Additive

Microfab Cu-300 Br

Microfab Cu-300 LE

Microfab Cu-300 Make-up

Microfab Cu-300 SP

Microfab Cu-300 Starter

MICROFAB DVF 200 MU

MICROFAB DVF 200-B

MICROFAB DVF 200-C

MicroFab Ni-100 Make-up

Micronox MX2302

Microposit (TM) LDD(TM) -26W Developer

Microposit Developer CD-30

Microposit Developer Concentrate

Microposit EC Solvent 13

Microposit MF CD-26 Developer

Microstrip 5002

mr-I 7000E Series Imprint Polymer

mr-UVCur06

mr-UVCur21-100nm

N - (3 - Dimethylaminopropyl) - N ′ - ethylcarbodiimide

N-(3-Dimethylaminopropyl)-N′-ethylcarbodiimide hydrochloride

N-(3-Oxododecanoyl)-L-homoserine lactone

N, N-Dimethylacrylamide, 99%

N2O

NANO 495 PMMA Series Resist in Anisol

Nano LOR B Series Resist

NANO MIBK//IPA Series

NANO Remover PG Photoresist Remover

Nano-Strip 2X

Negative Tone Photoresist ma-N 2403

N-Hydroxysuccinimide

Nickel (II) Chloride Hexahydrate

Nickel Acetate

Nickel Etchant TFB

Nickel Etchant TFG

Nickel Plating Strike, Electroless

Nickel sulfamate

NICKEL SULFAMATE SEMI BRIGHT RTU (MECHANICAL)

Nickel Sulfate Hexahydrate

Nickelex

Niobium Etch NB

Nitrous Oxide

N-Methyl-2-pyrrolidinone

Norland Optical Adhesive 68

Norland Optical Adhesive 81

Norland Optical Adhesive 89

Norsorex-Norsorex-1

Omnicoat Organic Polymer Solution

Organic Polymer Solution

Organic Polymer Solution PMGI SF Series Resist

Orthogonal Developer 100 Solution

Orthogonal Stripper 700 Solution

OSCoR2312 Photoresist Solution

P3HT

P499 - P512 Phosphorus Spin On Dopant

PA-400D Polyimide Developer

PA-400R Polyimide Ancillary

Palladium (II) Chloride

Palladium Standard Solution

Palladium(II) acetate

PBS Phosphate Buffered Saline

PC 65 ELECTROLYTE

PC Electroless Copper Solution A

PC Electroless Copper Solution B

PC Electroless Copper Solution C

PC Electroless Copper Solution D

PD-86-50 Negative Developer

PELCO High Performance Nickel Paste

PELCO High Temperatue Carbon Paste

PEPR 2400 Photoresist

Perfluoroheptane

PF-95 Photomask Fixer

Phenolphthalein

Phenothiazine

Phosphorosilica Film

PHOSPHORUS DOPANT COATING PDC1-2000

Photoneece DL-1000

Photoneece PWDC-1000

Photoposit Type P Thinner

Platinum Etchant 1:1 Part A

PLATINUM ETCHANT 1:1 PART B

PMMA STD Resist

poly (3,4-ethylenedioxythiophrene) // poly (styrenesulfonate)

Poly (4-Vinylphenol)

Poly (Ethylene Glycol) Acrylate

Poly [(Methyl Methacrylate) - Co- ( Disperse Red 1 Methacrylate)]

Poly(D,L-lactide) ester terminated

Poly(Ethylene Glycol) Dimethacrylate

Poly(Ethylne Glycol) Diacrylate

Polyacrylic Acid in 25% Solids in water

Polybead Styrene 25 Micron Microspheres

Polycaprolactone

Polydimethylsiloxane

Polyethylene glycol-(silane)2

Polyethyleneimine

Polyisoprene

Poly-L-lysine hydrobromide

Polymersolution for Nanoimprint Lithography mr-I 7000 Series

Polymersolution for Nanoimprint Lithography mr-I 9000 Series

Polymethyl methacrylate

Polypropylene Carbonate

POLYSTYRENE-BLOCK-POLYISOPRENE-BLOCKPOLYSTYRENE

Polyvinyl Alchohol

Polyvinylpyrrolidone

Potassium Aurocyanide

Potassium Carbonate Anhydrous

Potassium Cyanide

Potassium Dichromate

Potassium Ferricyanide

Potassium Fluoride Aqueous Solution

Potassium Hydroxide

Potassium Hydroxide Pellets

Potassium Iodide

Potassium Permanganate

Potassium tris(oxalato)ferrate(III) trihydrate

Powder Dam Chemical Absorbent

PR1-2000A Positive Resist

PSA/KLK3/Kallikrein 3/Prostate Specific Antigen Antibody (A67-B/E3)

QZ 3501 Polyimide Developer

QZ 3512 Polymide Rinse

R//Flex 3000 Series LCP Films

Reactive Silver Ink

Remover PG

RenShape SL 5510

Rhodorsil Photoinitiator 2074

Rinse T1100

Riston FX515 Photopolymer Film

Ronamerse SMT Catalyst Concentrate

Silicon Tetrachloride

Silicone Elastomer Base

Silicone oil

Silicone Potting Compound

Siloxane polymer solution

Silver

Silver Etchant Type TFS

Silver Nitrate

SM-30 colloidal silica

Sodium n-dodecyl sulfate

Sodium Periodate

Sodium Persulfate

Sodium phosphate monobasic monohydrate

Sodium saccharin

Sodium Tungstate Dihydrate

Solder Mask Hardener

Solderon Acid

Solderon Lead Concentrate

SPR-220 7.0 Positive Photoresist

Stannous Chloride Dihydrate

Sumiresin Excel CRC-8650

Sumiresist NEB-22A5//B8

Summa-Clean(R) SC-15M

SurPass 3000

Sylgard 184

Sylgard 184 Silicone Elastomer

Techni Gold 25 ES RTU

TECHNI MATTE TIN 89 RTU

Techni NF 820 HS Make up

Techni NF 820 HS RTU 60//40

Techni NF 820 HS Secondary Additive

Techni PC 75 Brightener

Techni PC 75 Carrier

TECHNI SOLDER MATTE NF 820 60/40 RTU

TECHNIC CU 2800 BRIGHTENER

TECHNIC CU 2800 CARRIER

Techni-Gold 25 ES RTU

TECHNISTAN Ag ACID

TECHNISTAN AG BRIGHTENER

TECHNISTAN AG MAKE UP

TECHNISTAN AG SILVER CONCENTRATE

TECHNISTAN AG TIN CONCENTRATE

Tetraamminepalladium(II) chloride monohydrate

tetraethyl orthosilicate (TEOS)

Tetrafluoroboric acid

Tetrafluoromethane

tetrahydrofuran

tetrakis(dimethylamido)hafnium(IV)

tetrakis(dimethylamido)titanium(IV)

tetrakis(dimethylamido)zirconium(IV)

Tetralin (1,2,3,4-Tetrahydronaphthalene)

Tetramethylammonium Hydroxide

Tin Oxide Etchant TE-100

Titanium Diisopropoxide

Titanium Diisopropoxide Bis(2,4-Pentanedionate)

Titanium Etchant

Titanium Etchant TFT

Titanium etchant TFTN

Titanium Nitride Etch 22-7

Ti-Tungsten Etchant TiW-30

TM-40 colloidal silica

Toluene

Traffic Lane Cleaner (t-LC)

Trichloroethylene (TCE)

Triethylamine

Trifluoromethane

trifluoromethanesulfonic acid

trimethyl(methylcyclopentadienyl)platinum(IV)

trimethylaluminum

Trimethylol propane triacrylate

Tripropylene glycol monomethyl ether (TPM)

tris(dimethylamino)silane

Tris(methylcyclopentadienyl)erbium

Tris(Tert-butoxy)silanol

trisdimethylaminotitanium (aka TDMAT)

Tungsten Etchant TFW, Chromium Cermet Etchant-TFE

Ultradel A600 Adhesion Promoter

Ultradel D760 Developer

Ultrafill A-2001 Accelerator

Ultrafill S-2001 Suppressor

Unity 2203P

Unity 4678E

Unity Sacrificial Polymers

UV - 69

UV6-0.7 DUV Photoresist

VM651

VM652

Wafer Grip Adhesive Film

WL-53-50 Photopatternable Spin-on Silicone

WL-5351 Photopatternable Spin-on Silicone

WL-9653 Silicone Film Developer Dev Sample

Xenon Difluoride

XP MicroSpray Positive Photoresist Spray

XP-3636 Opto Developer

XP-3637 Opto Core

XR-1541 E-Beam Resist

ZAP1010-1020 Adhesion Promoter

ZIRCONIUM n-PROPOXIDE 70% in n-PROPANOL

ZMD-D

ZP4951 Fluorinated polyether copolymer

ZPN 2464-27 Resist

Process Gases

Solid Source Materials

2,2-DIMETHOXY-2-PHENYLACETOPHENONE

3-Amino-1,2,4 Triazole

3-Aminopropyl functionalized silica

9-Anthracenemethanol

Ammonium iron(III) Oxalate Trihydrate

Lanthanum Boride (LaB6)

Molybdenum Trioxide

Ruthenium

Vanadium

Special Source Materials

3000 Fixer//Replenisher

Adipic Acid

Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn

Standard Laboratory Chemical

1,2,3-Trichloropropane

1,6-Hexanediol diacrylate

1112A Remover

11-Mercapto-1-undecanol

1M Sodium Hydroxide

1-Methoxy-2-propanol

1-methoxy-2-propanol acetate

1-Methyl-2-pyrrolidinone

1-propanethiol

2% XR-1541

24K Pure Gold Solution

2-aminopropyltrimethoxysilane

2-Benzyl-2-(dimethylamino)-4′- morpholinobutyrophenone

2-Butanone

2-Butoxyethanol

2-butoxyethyl acetate

2-methoxyethanol

2-Methylimidazole

2-Propanol

3,3′-Dithiodipropionic acid

3‐glycidyloxypropyl)trimethoxysilane

3M Sodium Hydroxide

4-Dodecylbenzenesulfonic acid

6-Mercapto-1-hexanol

7-Diethylamino-3-thenoylcoumarin

92-023 Primer

950 PMMA Series Resists in Chlorobenzene

Alkyl ammonium hydroxide (TMAH 2.38%) Solution

Aluminum Etchant type A

Aluminum Etchant Type A + NiFe

Aluminum Etchant type D

AZ - 300 MIF Developer

AZ 10XT-520cp Photoresist

AZ 1915 in Photoresist

AZ 400T Photoresist Stripper

AZ 4999 Photoresist

AZ 9620 Photoresist

AZ BARLI-II 90

AZ EXP P4903 Photoressist

AZ P4330-RS

Barium Titanate

Bathocuproine/2,9-Dimethyl-4,7-diphenyl-1,10-phenanthroline

Benzoic Acid

Bismuth (III) Oxynitrate

Bisphenol A Diglycidyl Ether Resin

Borane Dimethylamine Complex

Bovine Serum Albumin

BrewerBOND 305 (Mixture of D-Limonene, polymer Solids and Additive)

BrewerBOND 510 ( Mixture of Ethyl-3-ethoxypropionate (EEP), 1-Methoxy-2-propanol (Propylene glycol monomethyl ether, PGME), and Polymer solids)

Buffered Oxide Etch 6:1

Buffered Oxide Etchant 10:1

Copper (49.5%)Zinc (27.5%)Tin (23%) At%

CYCLOTENE 6505

Deionized Ultra-filtered Water

Di(trimethylolpropane) tetraacrylate

Dibromomethane

Dibutylamine

Dielectric Coating DC4-500

Diethyl fumarate

DisCharge H2Ox2

Disodium Trioxosilicate

DOWSIL 340 Heat Sink Compound

Easypoxy K-230

Ecoflex Gel Part A & B

EDTA

Eleane M8850

Elevate Ni 5910 Plating Solution

Elevate Ni 5910 SB Additive

Elevate Ni Buffer Salt

First Contact Polymer Solutions

FITC anti-mouse IgG2a Antibody

Fluorescein sodium salt

HPS-FG57B High Performance Silver Ink

H-SiQ Negative EBL Resist

Intermediate Coating IC1-1000

intervia Bpn 65a photoresist

Isopropyl Alcohol (IPA)

Lead Iodide

Liquid stainless steel flux

Loctite EDAG PR 406

LOR A-series resist

Manganese Sulfate

ma-P 1275G Photoresist

Metalon HPR-059 Carbon Screen Ink

Metalon HPS-FG57B Ag Ink

Methanol

MICCRO® ST-210

Microposit 352 Developer

Microposit 354 Developer

Microposit 453 Developer

Microposit Edge Bead Remover EBR 10-A

Microposit MF - 351 Developer

Microposit MF-319 Developer

Microposit MF-321 Developer

Microposit MF-322 Developer

Microposit Primer

Microposit remover 1112 A

Microposit Remover 1165

Microposit SC1805 Photoresist

Microposit SJR 5740 Photo Resist

Microprime Primer P-20

MMA(8.5)MAA Copolymer Series Resists

MWCNTs

Nafion® perfluorinated resin solution

n-Butanol

NDG-2000

Negative Resist NR2-20000P

Negative Resist NR2-8000P

Negative Resist NR3- 8000P

Negative Resist NR4-8000P

Negative Resist NR7-80P

Negative Resist NR9-8000

Nickel Etchant Type I

Nickel(II) carbonate basic hydrate

Nitric Acid

n-OCTADECYLTRICHLOROSILANE

NR5-8000 Negative Resist

NR7-1000P

NR7-1000PY Negative Resist

NR71-3000p Negative Photoresist

NR9-1500py Negative Photoresist

NR9-3000PY

NR9-8000

Oakite 31

Octadecyltricholorosilane

Octafluorocyclobutane

OrmoComp

PEDOT:PSS

PEDOT:PSS (inkjet)

Pentaerythritol tetrakis(3- mercaptopropionate)

Phosphoric Acid

Piezoelectric PVDF

Poly(2-hydroxyethyl methacrylate)

Poly(ethylene glycol) diacrylate -575

Poly(ethylene glycol) diacrylate-700

poly(ethylene oxide)

Poly(methyl methacrylate)

Poly(vinylidene fluoride)

Polyacylic acid (Superabsorbent)

Polystyrene solution

Potassium Chloride

Potassium phosphate monobasic

Propanol

Propylene Glycol Methyl Ether Acetate

SC1813 Positive Photoresist

SC1827 Positive Photoresist

Silicon Wafer 4" (Prime Grade)

Sodium Acetate

Sodium Dodecyl Sulfate

SPR 700 1.2 Positive Photoresist

SU 8 Series

SU-8 100 Series Resist

SU-8 2000 Series Resists

SU-8 3005 Series Resist

SU-8 3050

SU-8 6005

SU-8 Negative Photoresist

Synthetic oligonucleotide

TAE Buffer, 10X, Molecular Biology Grade

Teflon AF 1600

Transene Al Etchant Type D

Transetch-N

TRIS EDTA buffer

Tris(2-carboxyethyl)phosphine hydrochloride

Tri-sodium phosphate dodecahydrate

Tungsten Etchant TFW(Alkaline Potassium Ferricyanide)

Zinc nitrate hexahydrate

Zinc Sulfide

ZoneBOND® Remover 2112 (D-Limonene)

Substrates

AP200

Chemical Name

Provided

Exists In Cleanroom

Locations

Owners

Equipment Group

Associated Files

(3,3,3-TRIFLUOROPROPYL)DIMETHYLCHLOROSILANE

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IMS- Micro/Nano Fabrication Facility

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(3-Mercaptopropyl)trimethoxysilane

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(Tridecafluoro-1,1,2,2-tetrahydrooctyl) -1-dimethylchlorosilane

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1% B2H6 in H2

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1% XR-1541

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1%PH3 in H2

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1%PH3 in He

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1,2,3-Trichloropropane

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1,2,4-Trichlorobenzene

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1,2-Dichlorobenzene

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1,3,5-Trimethylbenzene

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1,6-Hexanediol diacrylate

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1112A Remover

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11-Mercapto-1-undecanol

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11-Mercaptoundecanoic acid

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1-Chloro-4-Propoxy-9H-Thioxanthen-9-one

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1M Sodium Hydroxide

Marcus Inorganic Cleanroom--Room 1279: Acid Storage

Mason Chilmonczyk

IMS- Micro/Nano Fabrication Facility

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1-Methoxy-2-propanol

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1-methoxy-2-propanol acetate

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1-Methyl-2-pyrrolidinone

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1-propanethiol

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2% XR-1541

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2%SiH4 in N2

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2-(2-Pyridinyldithio)ethaneamine hydrochloride

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2,2,4 -Trimethylpentane, Anhydrous

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2,2-DIMETHOXY-2-PHENYLACETOPHENONE

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2,4-Diethyl-9H-Thioxanthen-9-one

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24K Pure Gold Solution

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2-aminopropyltrimethoxysilane

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2-Benzyl-2-(dimethylamino)-4′- morpholinobutyrophenone

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2-Butanone

Marcus Inorganic Cleanroom--Room 1279

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2-Butoxyethanol

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2-butoxyethyl acetate

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2-Ethyl-9,10-Dimethoxyanthracene

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2-Heptanone

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2-methoxyethanol

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2-Methylimidazole

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2-Propanol

Pettit Cleanroom

Marcus Inorganic Cleanroom--Room 1279

Reza Abbaspour

IMS- Micro/Nano Fabrication Facility

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3,3′-Dithiodipropionic acid

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IMS- Micro/Nano Fabrication Facility

3000 Fixer//Replenisher

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IMS- Micro/Nano Fabrication Facility

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3-Amino-1,2,4 Triazole

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IMS- Micro/Nano Fabrication Facility

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3-Aminopropyl functionalized silica

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IMS- Micro/Nano Fabrication Facility

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3-Aminopropyltriethoxysilane

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IMS- Micro/Nano Fabrication Facility

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3‐glycidyloxypropyl)trimethoxysilane

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IMS- Micro/Nano Fabrication Facility

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3M Developmental Material EAS-1735 (Experimental)

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IMS- Micro/Nano Fabrication Facility

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3M Sodium Hydroxide

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IMS- Micro/Nano Fabrication Facility

495 PMMA Series Resists in Anisole

Marcus Inorganic Cleanroom--Room 1279

Chris Yang
Don Creyts

IMS- Micro/Nano Fabrication Facility

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4-Chloro 1-Naphthol

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4-Dodecylbenzenesulfonic acid

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5% B2H6 in N2

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IMS- Micro/Nano Fabrication Facility

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Chemical NamelnkSort	ClassificationlnkSort	StatuslnkSort	SubmitterlnkSort	Submitted Date TimelnkSort
TRIS EDTA (IDTE) buffer View Conversation SDS Link	Not Classified	Waiting On Organizer	Robert Ford	04-04-2023
Immobilized TCEP Disulfide Reducing Gel View Conversation SDS Link	Not Classified	Waiting On Organizer	Robert Ford	04-14-2023
N-a-Benzoyl-DL-arginine-4-nitroanilide hydrochloride View Conversation SDS Link	Not Classified	Waiting On Organizer	Chinaza Ogbonna	09-26-2023
Trypsin inhibitor, soybeans View Conversation SDS Link	Not Classified	Waiting On Organizer	Chinaza Ogbonna	09-27-2023
Trypsin, porcine pancreas View Conversation SDS Link	Not Classified	Waiting On Organizer	Chinaza Ogbonna	09-27-2023
Calcium chloride View Conversation SDS Link	Not Classified	Waiting On Organizer	Chinaza Ogbonna	27 Mar
Casein, from bovine milk View Conversation SDS Link	Not Classified	Waiting On Organizer	Chinaza Ogbonna	27 Mar
Nitrilotriacetic acid View Conversation SDS Link	Not Classified	Waiting On Organizer	Jaewon Lee	9 Apr
Ammonium Persulfate View Conversation SDS Link	Standard Laboratory Chemical	Waiting On Reviewers	Milette Handley	26 Jun
AZ-P4330-RS View Conversation SDS Link	Not Classified	Waiting On Organizer	Andriy Dotsenko	29 Oct (3 weeks ago)
Elevate Gold 7934 Electrolyte View Conversation SDS Link	Not Classified	Waiting On Organizer	Shane Oh	31 Oct (3 weeks ago)
Elevate Gold 7934 Gold Concentrate View Conversation SDS Link	Not Classified	Waiting On Organizer	Shane Oh	31 Oct (3 weeks ago)

12 records